Sputtering of H+ on Ta(pc) at 300 K
Sputtering of H+ on Ta(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 483.1 | 0.0 | |
| 538.7 | 8.89e-05 | |
| 600.6 | 0.0001637 | |
| 669.7 | 0.000245 | |
| 746.7 | 0.0003358 | |
| 832.5 | 0.0004376 | |
| 928.2 | 0.0005509 | |
| 1035.0 | 0.0006756 | |
| 1154.0 | 0.000811 | |
| 1287.0 | 0.0009557 | |
| 1435.0 | 0.001108 | |
| 1599.0 | 0.001264 | |
| 1783.0 | 0.001423 | |
| 1988.0 | 0.00158 | |
| 2217.0 | 0.001733 | |
| 2472.0 | 0.001878 | |
| 2756.0 | 0.002013 | |
| 3073.0 | 0.002135 | |
| 3426.0 | 0.002243 | |
| 3820.0 | 0.002335 | |
| 4259.0 | 0.002411 | |
| 4749.0 | 0.00247 | |
| 5295.0 | 0.002514 | |
| 5904.0 | 0.002541 | |
| 6583.0 | 0.002554 | |
| 7340.0 | 0.002553 | |
| 8183.0 | 0.002538 | |
| 9124.0 | 0.002513 | |
| 10170.0 | 0.002476 | |
| 11340.0 | 0.002431 | |
| 12650.0 | 0.002377 | |
| 14100.0 | 0.002316 | |
| 15720.0 | 0.002249 | |
| 17530.0 | 0.002177 | |
| 19550.0 | 0.002101 | |
| 21790.0 | 0.002022 | |
| 24300.0 | 0.00194 | |
| 27090.0 | 0.001858 | |
| 30210.0 | 0.001774 | |
| 33680.0 | 0.00169 | |
| 37550.0 | 0.001607 | |
| 41870.0 | 0.001524 | |
| 46680.0 | 0.001443 | |
| 52050.0 | 0.001363 | |
| 58030.0 | 0.001286 | |
| 64710.0 | 0.001211 | |
| 72150.0 | 0.001138 | |
| 80440.0 | 0.001068 | |
| 89690.0 | 0.001001 |
E = 483.1 – 100000