Sputtering of H+ on Ta(pc) at 300 K
Sputtering of H+ on Ta(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
483.1 | 0.0 | |
538.7 | 8.89e-05 | |
600.6 | 0.0001637 | |
669.7 | 0.000245 | |
746.7 | 0.0003358 | |
832.5 | 0.0004376 | |
928.2 | 0.0005509 | |
1035.0 | 0.0006756 | |
1154.0 | 0.000811 | |
1287.0 | 0.0009557 | |
1435.0 | 0.001108 | |
1599.0 | 0.001264 | |
1783.0 | 0.001423 | |
1988.0 | 0.00158 | |
2217.0 | 0.001733 | |
2472.0 | 0.001878 | |
2756.0 | 0.002013 | |
3073.0 | 0.002135 | |
3426.0 | 0.002243 | |
3820.0 | 0.002335 | |
4259.0 | 0.002411 | |
4749.0 | 0.00247 | |
5295.0 | 0.002514 | |
5904.0 | 0.002541 | |
6583.0 | 0.002554 | |
7340.0 | 0.002553 | |
8183.0 | 0.002538 | |
9124.0 | 0.002513 | |
10170.0 | 0.002476 | |
11340.0 | 0.002431 | |
12650.0 | 0.002377 | |
14100.0 | 0.002316 | |
15720.0 | 0.002249 | |
17530.0 | 0.002177 | |
19550.0 | 0.002101 | |
21790.0 | 0.002022 | |
24300.0 | 0.00194 | |
27090.0 | 0.001858 | |
30210.0 | 0.001774 | |
33680.0 | 0.00169 | |
37550.0 | 0.001607 | |
41870.0 | 0.001524 | |
46680.0 | 0.001443 | |
52050.0 | 0.001363 | |
58030.0 | 0.001286 | |
64710.0 | 0.001211 | |
72150.0 | 0.001138 | |
80440.0 | 0.001068 | |
89690.0 | 0.001001 |
E = 483.1 – 100000