{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ta", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of H+ on Ta(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.5966, "q": 0.0078, "mu": 0.7141, "epsilonL": 0.0001031, "Eth": 483.1}, "E_min": 483.1, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
483.1	0.0	
538.7	8.89e-05	
600.6	0.0001637	
669.7	0.000245	
746.7	0.0003358	
832.5	0.0004376	
928.2	0.0005509	
1035.0	0.0006756	
1154.0	0.000811	
1287.0	0.0009557	
1435.0	0.001108	
1599.0	0.001264	
1783.0	0.001423	
1988.0	0.00158	
2217.0	0.001733	
2472.0	0.001878	
2756.0	0.002013	
3073.0	0.002135	
3426.0	0.002243	
3820.0	0.002335	
4259.0	0.002411	
4749.0	0.00247	
5295.0	0.002514	
5904.0	0.002541	
6583.0	0.002554	
7340.0	0.002553	
8183.0	0.002538	
9124.0	0.002513	
10170.0	0.002476	
11340.0	0.002431	
12650.0	0.002377	
14100.0	0.002316	
15720.0	0.002249	
17530.0	0.002177	
19550.0	0.002101	
21790.0	0.002022	
24300.0	0.00194	
27090.0	0.001858	
30210.0	0.001774	
33680.0	0.00169	
37550.0	0.001607	
41870.0	0.001524	
46680.0	0.001443	
52050.0	0.001363	
58030.0	0.001286	
64710.0	0.001211	
72150.0	0.001138	
80440.0	0.001068	
89690.0	0.001001	
-----