Sputtering of Xe+ on Si(pc) at 300 K
Sputtering of Xe+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 45.15 | 0.0 | |
| 52.84 | 8.352e-05 | |
| 61.83 | 0.0003461 | |
| 72.36 | 0.0008979 | |
| 84.68 | 0.001924 | |
| 99.09 | 0.003711 | |
| 116.0 | 0.006689 | |
| 135.7 | 0.01149 | |
| 158.8 | 0.01899 | |
| 185.8 | 0.03036 | |
| 217.5 | 0.04706 | |
| 254.5 | 0.07076 | |
| 297.8 | 0.1031 | |
| 348.5 | 0.1452 | |
| 407.8 | 0.1976 | |
| 477.3 | 0.2598 | |
| 558.5 | 0.3302 | |
| 653.6 | 0.4066 | |
| 764.8 | 0.487 | |
| 895.0 | 0.5696 | |
| 1047.0 | 0.6533 | |
| 1226.0 | 0.7374 | |
| 1434.0 | 0.8218 | |
| 1679.0 | 0.9069 | |
| 1964.0 | 0.9928 | |
| 2299.0 | 1.08 | |
| 2690.0 | 1.169 | |
| 3148.0 | 1.26 | |
| 3684.0 | 1.353 | |
| 4311.0 | 1.447 | |
| 5045.0 | 1.545 | |
| 5903.0 | 1.643 | |
| 6908.0 | 1.744 | |
| 8084.0 | 1.847 | |
| 9461.0 | 1.95 | |
| 11070.0 | 2.054 | |
| 12960.0 | 2.159 | |
| 15160.0 | 2.263 | |
| 17740.0 | 2.366 | |
| 20760.0 | 2.468 | |
| 24300.0 | 2.568 | |
| 28430.0 | 2.665 | |
| 33270.0 | 2.758 | |
| 38940.0 | 2.847 | |
| 45570.0 | 2.931 | |
| 53320.0 | 3.008 | |
| 62400.0 | 3.079 | |
| 73020.0 | 3.142 | |
| 85450.0 | 3.196 |
E = 45.15 – 100000