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Plasma-Surface Interaction Data Set 217

Sputtering of Xe+ on Si(pc) at 300 K

  1. B144: W. Eckstein, "Sputtering Yields. In: Sputtering by Particle Bombardment", Topics in Applied Physics 110 (2007). [https://doi.org/10.1007/978-3-540-44502-9_3]

Sputtering of Xe+ on Si(pc) at 300 K

angle = 0.0 deg E /eV P
45.150.0
52.848.352e-05
61.830.0003461
72.360.0008979
84.680.001924
99.090.003711
116.00.006689
135.70.01149
158.80.01899
185.80.03036
217.50.04706
254.50.07076
297.80.1031
348.50.1452
407.80.1976
477.30.2598
558.50.3302
653.60.4066
764.80.487
895.00.5696
1047.00.6533
1226.00.7374
1434.00.8218
1679.00.9069
1964.00.9928
2299.01.08
2690.01.169
3148.01.26
3684.01.353
4311.01.447
5045.01.545
5903.01.643
6908.01.744
8084.01.847
9461.01.95
11070.02.054
12960.02.159
15160.02.263
17740.02.366
20760.02.468
24300.02.568
28430.02.665
33270.02.758
38940.02.847
45570.02.931
53320.03.008
62400.03.079
73020.03.142
85450.03.196

Fit Function: SPTEEX

\[Y(E) = \frac{q}{2} \frac{\left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \ln(1 + 1.2288\epsilon)}{\lambda + \left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \left[ \epsilon + 0.1728\sqrt{\epsilon} + 0.008\epsilon^{0.1504} \right]}\]
Coefficients
Fit range

E = 45.15 – 100000