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Plasma-Surface Interaction Data Set 215

Sputtering of Ar+ on Si(pc) at 300 K

  1. B144: W. Eckstein, "Sputtering Yields. In: Sputtering by Particle Bombardment", Topics in Applied Physics 110 (2007). [https://doi.org/10.1007/978-3-540-44502-9_3]

Sputtering of Ar+ on Si(pc) at 300 K

angle = 0.0 deg E /eV P
32.840.0
38.680.0002956
45.560.001139
53.660.002824
63.210.005842
74.450.01091
87.690.019
103.30.0314
121.70.04957
143.30.07497
168.80.1087
198.80.1511
234.20.2013
275.80.2575
324.90.3173
382.60.3784
450.70.4388
530.90.4973
625.30.5535
736.50.6072
867.50.6587
1022.00.7083
1204.00.7563
1418.00.8028
1670.00.848
1967.00.892
2316.00.9346
2729.00.9759
3214.01.016
3785.01.053
4459.01.089
5252.01.123
6186.01.154
7286.01.181
8582.01.206
10110.01.226
11910.01.243
14020.01.254
16520.01.261
19460.01.263
22920.01.259
26990.01.25
31790.01.235
37450.01.214
44110.01.187
51950.01.155
61200.01.118
72080.01.076
84900.01.031

Fit Function: SPTEEX

\[Y(E) = \frac{q}{2} \frac{\left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \ln(1 + 1.2288\epsilon)}{\lambda + \left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \left[ \epsilon + 0.1728\sqrt{\epsilon} + 0.008\epsilon^{0.1504} \right]}\]
Coefficients
Fit range

E = 32.84 – 100000