Sputtering of Ar+ on Si(pc) at 300 K
Sputtering of Ar+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 32.84 | 0.0 | |
| 38.68 | 0.0002956 | |
| 45.56 | 0.001139 | |
| 53.66 | 0.002824 | |
| 63.21 | 0.005842 | |
| 74.45 | 0.01091 | |
| 87.69 | 0.019 | |
| 103.3 | 0.0314 | |
| 121.7 | 0.04957 | |
| 143.3 | 0.07497 | |
| 168.8 | 0.1087 | |
| 198.8 | 0.1511 | |
| 234.2 | 0.2013 | |
| 275.8 | 0.2575 | |
| 324.9 | 0.3173 | |
| 382.6 | 0.3784 | |
| 450.7 | 0.4388 | |
| 530.9 | 0.4973 | |
| 625.3 | 0.5535 | |
| 736.5 | 0.6072 | |
| 867.5 | 0.6587 | |
| 1022.0 | 0.7083 | |
| 1204.0 | 0.7563 | |
| 1418.0 | 0.8028 | |
| 1670.0 | 0.848 | |
| 1967.0 | 0.892 | |
| 2316.0 | 0.9346 | |
| 2729.0 | 0.9759 | |
| 3214.0 | 1.016 | |
| 3785.0 | 1.053 | |
| 4459.0 | 1.089 | |
| 5252.0 | 1.123 | |
| 6186.0 | 1.154 | |
| 7286.0 | 1.181 | |
| 8582.0 | 1.206 | |
| 10110.0 | 1.226 | |
| 11910.0 | 1.243 | |
| 14020.0 | 1.254 | |
| 16520.0 | 1.261 | |
| 19460.0 | 1.263 | |
| 22920.0 | 1.259 | |
| 26990.0 | 1.25 | |
| 31790.0 | 1.235 | |
| 37450.0 | 1.214 | |
| 44110.0 | 1.187 | |
| 51950.0 | 1.155 | |
| 61200.0 | 1.118 | |
| 72080.0 | 1.076 | |
| 84900.0 | 1.031 |
E = 32.84 – 100000