{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Si", "surface_phase": "pc", "species": {"text": "Ar+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Ar+ on Si(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.277, "q": 3.23, "mu": 1.528, "epsilonL": 1.497e-05, "Eth": 32.84}, "E_min": 32.84, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
32.84	0.0	
38.68	0.0002956	
45.56	0.001139	
53.66	0.002824	
63.21	0.005842	
74.45	0.01091	
87.69	0.019	
103.3	0.0314	
121.7	0.04957	
143.3	0.07497	
168.8	0.1087	
198.8	0.1511	
234.2	0.2013	
275.8	0.2575	
324.9	0.3173	
382.6	0.3784	
450.7	0.4388	
530.9	0.4973	
625.3	0.5535	
736.5	0.6072	
867.5	0.6587	
1022.0	0.7083	
1204.0	0.7563	
1418.0	0.8028	
1670.0	0.848	
1967.0	0.892	
2316.0	0.9346	
2729.0	0.9759	
3214.0	1.016	
3785.0	1.053	
4459.0	1.089	
5252.0	1.123	
6186.0	1.154	
7286.0	1.181	
8582.0	1.206	
10110.0	1.226	
11910.0	1.243	
14020.0	1.254	
16520.0	1.261	
19460.0	1.263	
22920.0	1.259	
26990.0	1.25	
31790.0	1.235	
37450.0	1.214	
44110.0	1.187	
51950.0	1.155	
61200.0	1.118	
72080.0	1.076	
84900.0	1.031	
-----