Sputtering of Ne+ on Si(pc) at 300 K
Sputtering of Ne+ on Si(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
23.41 | 0.0 | |
27.77 | 0.0003844 | |
32.93 | 0.001481 | |
39.06 | 0.003685 | |
46.32 | 0.00764 | |
54.94 | 0.01427 | |
65.16 | 0.02477 | |
77.28 | 0.04055 | |
91.66 | 0.063 | |
108.7 | 0.09303 | |
128.9 | 0.1306 | |
152.9 | 0.1746 | |
181.4 | 0.2229 | |
215.1 | 0.2728 | |
255.1 | 0.3221 | |
302.6 | 0.3692 | |
358.9 | 0.4135 | |
425.6 | 0.4546 | |
504.8 | 0.4929 | |
598.7 | 0.5286 | |
710.1 | 0.5621 | |
842.2 | 0.5936 | |
998.8 | 0.6232 | |
1185.0 | 0.6512 | |
1405.0 | 0.6774 | |
1666.0 | 0.7018 | |
1976.0 | 0.7242 | |
2344.0 | 0.7446 | |
2780.0 | 0.7626 | |
3297.0 | 0.778 | |
3910.0 | 0.7906 | |
4638.0 | 0.8002 | |
5501.0 | 0.8064 | |
6524.0 | 0.8091 | |
7738.0 | 0.808 | |
9177.0 | 0.803 | |
10880.0 | 0.794 | |
12910.0 | 0.7809 | |
15310.0 | 0.7639 | |
18160.0 | 0.7431 | |
21540.0 | 0.7188 | |
25540.0 | 0.6912 | |
30290.0 | 0.6608 | |
35930.0 | 0.6281 | |
42610.0 | 0.5936 | |
50540.0 | 0.5579 | |
59940.0 | 0.5215 | |
71090.0 | 0.4849 | |
84320.0 | 0.4486 |
E = 23.41 – 100000