{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Si", "surface_phase": "pc", "species": {"text": "Ne+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Ne+ on Si(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2995, "q": 2.069, "mu": 1.515, "epsilonL": 4.184e-05, "Eth": 23.41}, "E_min": 23.41, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
23.41	0.0	
27.77	0.0003844	
32.93	0.001481	
39.06	0.003685	
46.32	0.00764	
54.94	0.01427	
65.16	0.02477	
77.28	0.04055	
91.66	0.063	
108.7	0.09303	
128.9	0.1306	
152.9	0.1746	
181.4	0.2229	
215.1	0.2728	
255.1	0.3221	
302.6	0.3692	
358.9	0.4135	
425.6	0.4546	
504.8	0.4929	
598.7	0.5286	
710.1	0.5621	
842.2	0.5936	
998.8	0.6232	
1185.0	0.6512	
1405.0	0.6774	
1666.0	0.7018	
1976.0	0.7242	
2344.0	0.7446	
2780.0	0.7626	
3297.0	0.778	
3910.0	0.7906	
4638.0	0.8002	
5501.0	0.8064	
6524.0	0.8091	
7738.0	0.808	
9177.0	0.803	
10880.0	0.794	
12910.0	0.7809	
15310.0	0.7639	
18160.0	0.7431	
21540.0	0.7188	
25540.0	0.6912	
30290.0	0.6608	
35930.0	0.6281	
42610.0	0.5936	
50540.0	0.5579	
59940.0	0.5215	
71090.0	0.4849	
84320.0	0.4486	
-----