Sputtering of N+ on Si(pc) at 300 K
Sputtering of N+ on Si(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
16.7 | 0.0 | |
19.94 | 0.0001361 | |
23.81 | 0.0006644 | |
28.44 | 0.001934 | |
33.96 | 0.004542 | |
40.56 | 0.009427 | |
48.44 | 0.01794 | |
57.85 | 0.03175 | |
69.08 | 0.05248 | |
82.5 | 0.08094 | |
98.52 | 0.1164 | |
117.7 | 0.1565 | |
140.5 | 0.1978 | |
167.8 | 0.2377 | |
200.4 | 0.2745 | |
239.3 | 0.3077 | |
285.8 | 0.3376 | |
341.3 | 0.3646 | |
407.6 | 0.3894 | |
486.8 | 0.4124 | |
581.3 | 0.4338 | |
694.3 | 0.4539 | |
829.1 | 0.4726 | |
990.1 | 0.4899 | |
1182.0 | 0.5058 | |
1412.0 | 0.52 | |
1686.0 | 0.5325 | |
2014.0 | 0.5431 | |
2405.0 | 0.5515 | |
2872.0 | 0.5575 | |
3430.0 | 0.561 | |
4096.0 | 0.5618 | |
4892.0 | 0.5596 | |
5842.0 | 0.5545 | |
6977.0 | 0.5464 | |
8332.0 | 0.5353 | |
9951.0 | 0.5212 | |
11880.0 | 0.5044 | |
14190.0 | 0.4851 | |
16950.0 | 0.4636 | |
20240.0 | 0.4403 | |
24170.0 | 0.4156 | |
28870.0 | 0.3899 | |
34470.0 | 0.3636 | |
41170.0 | 0.3372 | |
49160.0 | 0.3109 | |
58710.0 | 0.2853 | |
70120.0 | 0.2604 | |
83740.0 | 0.2367 |
E = 16.7 – 100000