Sputtering of N+ on Si(pc) at 300 K
Sputtering of N+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 16.7 | 0.0 | |
| 19.94 | 0.0001361 | |
| 23.81 | 0.0006644 | |
| 28.44 | 0.001934 | |
| 33.96 | 0.004542 | |
| 40.56 | 0.009427 | |
| 48.44 | 0.01794 | |
| 57.85 | 0.03175 | |
| 69.08 | 0.05248 | |
| 82.5 | 0.08094 | |
| 98.52 | 0.1164 | |
| 117.7 | 0.1565 | |
| 140.5 | 0.1978 | |
| 167.8 | 0.2377 | |
| 200.4 | 0.2745 | |
| 239.3 | 0.3077 | |
| 285.8 | 0.3376 | |
| 341.3 | 0.3646 | |
| 407.6 | 0.3894 | |
| 486.8 | 0.4124 | |
| 581.3 | 0.4338 | |
| 694.3 | 0.4539 | |
| 829.1 | 0.4726 | |
| 990.1 | 0.4899 | |
| 1182.0 | 0.5058 | |
| 1412.0 | 0.52 | |
| 1686.0 | 0.5325 | |
| 2014.0 | 0.5431 | |
| 2405.0 | 0.5515 | |
| 2872.0 | 0.5575 | |
| 3430.0 | 0.561 | |
| 4096.0 | 0.5618 | |
| 4892.0 | 0.5596 | |
| 5842.0 | 0.5545 | |
| 6977.0 | 0.5464 | |
| 8332.0 | 0.5353 | |
| 9951.0 | 0.5212 | |
| 11880.0 | 0.5044 | |
| 14190.0 | 0.4851 | |
| 16950.0 | 0.4636 | |
| 20240.0 | 0.4403 | |
| 24170.0 | 0.4156 | |
| 28870.0 | 0.3899 | |
| 34470.0 | 0.3636 | |
| 41170.0 | 0.3372 | |
| 49160.0 | 0.3109 | |
| 58710.0 | 0.2853 | |
| 70120.0 | 0.2604 | |
| 83740.0 | 0.2367 |
E = 16.7 – 100000