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Plasma-Surface Interaction Data Set 207

Sputtering of H+ on Si(pc) at 300 K

  1. B144: W. Eckstein, "Sputtering Yields. In: Sputtering by Particle Bombardment", Topics in Applied Physics 110 (2007). [https://doi.org/10.1007/978-3-540-44502-9_3]

Sputtering of H+ on Si(pc) at 300 K

angle = 0.0 deg E /eV P
49.790.0
58.150.0002799
67.920.0006721
79.320.001195
92.640.001858
108.20.002655
126.40.003562
147.60.004539
172.30.005531
201.30.006484
235.10.007351
274.50.008098
320.60.008708
374.50.009176
437.30.009506
510.80.009709
596.50.009799
696.70.009788
813.70.00969
950.30.009517
1110.00.009279
1296.00.008988
1514.00.008652
1768.00.008281
2065.00.007882
2411.00.007464
2816.00.007033
3289.00.006595
3841.00.006158
4486.00.005725
5240.00.005302
6119.00.004891
7147.00.004496
8347.00.004119
9748.00.003762
11380.00.003425
13300.00.00311
15530.00.002817
18140.00.002545
21180.00.002294
24740.00.002063
28890.00.001852
33740.00.001659
39410.00.001484
46020.00.001325
53750.00.001181
62770.00.001051
73310.00.0009346
85620.00.0008297

Fit Function: SPTEEX

\[Y(E) = \frac{q}{2} \frac{\left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \ln(1 + 1.2288\epsilon)}{\lambda + \left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \left[ \epsilon + 0.1728\sqrt{\epsilon} + 0.008\epsilon^{0.1504} \right]}\]
Coefficients
Fit range

E = 49.79 – 100000