Sputtering of Xe+ on Th(pc) at 300 K
Sputtering of Xe+ on Th(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 26.48 | 0.0 | |
| 31.32 | 0.0001079 | |
| 37.06 | 0.0006058 | |
| 43.84 | 0.001915 | |
| 51.86 | 0.004776 | |
| 61.36 | 0.01041 | |
| 72.59 | 0.02071 | |
| 85.88 | 0.03829 | |
| 101.6 | 0.06627 | |
| 120.2 | 0.1076 | |
| 142.2 | 0.1637 | |
| 168.2 | 0.2341 | |
| 199.0 | 0.3158 | |
| 235.5 | 0.4051 | |
| 278.5 | 0.4988 | |
| 329.5 | 0.5951 | |
| 389.9 | 0.6936 | |
| 461.2 | 0.7949 | |
| 545.6 | 0.8999 | |
| 645.5 | 1.01 | |
| 763.7 | 1.126 | |
| 903.5 | 1.25 | |
| 1069.0 | 1.382 | |
| 1265.0 | 1.523 | |
| 1496.0 | 1.674 | |
| 1770.0 | 1.836 | |
| 2094.0 | 2.009 | |
| 2477.0 | 2.193 | |
| 2930.0 | 2.389 | |
| 3467.0 | 2.598 | |
| 4102.0 | 2.818 | |
| 4852.0 | 3.051 | |
| 5741.0 | 3.295 | |
| 6791.0 | 3.551 | |
| 8034.0 | 3.818 | |
| 9505.0 | 4.096 | |
| 11250.0 | 4.383 | |
| 13300.0 | 4.679 | |
| 15740.0 | 4.983 | |
| 18620.0 | 5.293 | |
| 22030.0 | 5.608 | |
| 26060.0 | 5.926 | |
| 30830.0 | 6.245 | |
| 36470.0 | 6.563 | |
| 43150.0 | 6.878 | |
| 51050.0 | 7.188 | |
| 60390.0 | 7.491 | |
| 71450.0 | 7.783 | |
| 84530.0 | 8.062 |
E = 26.48 – 100000