Sputtering of 4He+ on Os(pc) at 300 K
Sputtering of 4He+ on Os(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
115.8 | 0.0 | |
132.9 | 0.0001095 | |
152.6 | 0.0005296 | |
175.1 | 0.001455 | |
201.1 | 0.003107 | |
230.8 | 0.005659 | |
265.0 | 0.009118 | |
304.2 | 0.01326 | |
349.2 | 0.0177 | |
400.8 | 0.02204 | |
460.1 | 0.02599 | |
528.2 | 0.02944 | |
606.4 | 0.03241 | |
696.1 | 0.03496 | |
799.1 | 0.03717 | |
917.3 | 0.03911 | |
1053.0 | 0.04084 | |
1209.0 | 0.0424 | |
1388.0 | 0.04381 | |
1593.0 | 0.04511 | |
1829.0 | 0.04628 | |
2099.0 | 0.04735 | |
2410.0 | 0.0483 | |
2766.0 | 0.04914 | |
3176.0 | 0.04986 | |
3646.0 | 0.05045 | |
4185.0 | 0.05091 | |
4804.0 | 0.05123 | |
5515.0 | 0.05139 | |
6331.0 | 0.05141 | |
7268.0 | 0.05126 | |
8343.0 | 0.05094 | |
9578.0 | 0.05046 | |
10990.0 | 0.04982 | |
12620.0 | 0.049 | |
14490.0 | 0.04803 | |
16630.0 | 0.0469 | |
19090.0 | 0.04562 | |
21920.0 | 0.04422 | |
25160.0 | 0.04269 | |
28880.0 | 0.04106 | |
33160.0 | 0.03934 | |
38060.0 | 0.03756 | |
43700.0 | 0.03572 | |
50160.0 | 0.03385 | |
57580.0 | 0.03197 | |
66100.0 | 0.03009 | |
75880.0 | 0.02823 | |
87110.0 | 0.02641 |
E = 115.8 – 100000