{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Os", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of (4He)+ on Os(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1207, "q": 0.1315, "mu": 1.906, "epsilonL": 4.744e-05, "Eth": 115.8}, "E_min": 115.8, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
115.8	0.0	
132.9	0.0001095	
152.6	0.0005296	
175.1	0.001455	
201.1	0.003107	
230.8	0.005659	
265.0	0.009118	
304.2	0.01326	
349.2	0.0177	
400.8	0.02204	
460.1	0.02599	
528.2	0.02944	
606.4	0.03241	
696.1	0.03496	
799.1	0.03717	
917.3	0.03911	
1053.0	0.04084	
1209.0	0.0424	
1388.0	0.04381	
1593.0	0.04511	
1829.0	0.04628	
2099.0	0.04735	
2410.0	0.0483	
2766.0	0.04914	
3176.0	0.04986	
3646.0	0.05045	
4185.0	0.05091	
4804.0	0.05123	
5515.0	0.05139	
6331.0	0.05141	
7268.0	0.05126	
8343.0	0.05094	
9578.0	0.05046	
10990.0	0.04982	
12620.0	0.049	
14490.0	0.04803	
16630.0	0.0469	
19090.0	0.04562	
21920.0	0.04422	
25160.0	0.04269	
28880.0	0.04106	
33160.0	0.03934	
38060.0	0.03756	
43700.0	0.03572	
50160.0	0.03385	
57580.0	0.03197	
66100.0	0.03009	
75880.0	0.02823	
87110.0	0.02641	
-----