Sputtering of 4He+ on Ta(pc) at 300 K
Sputtering of 4He+ on Ta(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 116.3 | 1.761e-23 | |
| 133.5 | 0.0002682 | |
| 153.2 | 0.0008161 | |
| 175.9 | 0.001676 | |
| 201.9 | 0.002899 | |
| 231.7 | 0.004514 | |
| 266.0 | 0.006515 | |
| 305.3 | 0.008848 | |
| 350.5 | 0.01142 | |
| 402.3 | 0.01411 | |
| 461.8 | 0.0168 | |
| 530.1 | 0.01939 | |
| 608.4 | 0.02182 | |
| 698.4 | 0.02405 | |
| 801.7 | 0.02608 | |
| 920.2 | 0.0279 | |
| 1056.0 | 0.02953 | |
| 1212.0 | 0.03099 | |
| 1392.0 | 0.03229 | |
| 1597.0 | 0.03346 | |
| 1834.0 | 0.03449 | |
| 2105.0 | 0.0354 | |
| 2416.0 | 0.0362 | |
| 2773.0 | 0.03689 | |
| 3183.0 | 0.03746 | |
| 3654.0 | 0.03792 | |
| 4194.0 | 0.03827 | |
| 4814.0 | 0.03849 | |
| 5526.0 | 0.0386 | |
| 6343.0 | 0.03858 | |
| 7281.0 | 0.03844 | |
| 8357.0 | 0.03816 | |
| 9593.0 | 0.03776 | |
| 11010.0 | 0.03723 | |
| 12640.0 | 0.03658 | |
| 14510.0 | 0.0358 | |
| 16650.0 | 0.03491 | |
| 19110.0 | 0.03392 | |
| 21940.0 | 0.03282 | |
| 25180.0 | 0.03165 | |
| 28910.0 | 0.03039 | |
| 33180.0 | 0.02908 | |
| 38090.0 | 0.02773 | |
| 43720.0 | 0.02634 | |
| 50180.0 | 0.02493 | |
| 57600.0 | 0.02351 | |
| 66120.0 | 0.02211 | |
| 75900.0 | 0.02072 | |
| 87120.0 | 0.01935 |
E = 116.3 – 100000