{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ta", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of (4He)+ on Ta(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1193, "q": 0.0989, "mu": 1.317, "epsilonL": 4.995e-05, "Eth": 116.3}, "E_min": 116.3, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
116.3	1.761e-23	
133.5	0.0002682	
153.2	0.0008161	
175.9	0.001676	
201.9	0.002899	
231.7	0.004514	
266.0	0.006515	
305.3	0.008848	
350.5	0.01142	
402.3	0.01411	
461.8	0.0168	
530.1	0.01939	
608.4	0.02182	
698.4	0.02405	
801.7	0.02608	
920.2	0.0279	
1056.0	0.02953	
1212.0	0.03099	
1392.0	0.03229	
1597.0	0.03346	
1834.0	0.03449	
2105.0	0.0354	
2416.0	0.0362	
2773.0	0.03689	
3183.0	0.03746	
3654.0	0.03792	
4194.0	0.03827	
4814.0	0.03849	
5526.0	0.0386	
6343.0	0.03858	
7281.0	0.03844	
8357.0	0.03816	
9593.0	0.03776	
11010.0	0.03723	
12640.0	0.03658	
14510.0	0.0358	
16650.0	0.03491	
19110.0	0.03392	
21940.0	0.03282	
25180.0	0.03165	
28910.0	0.03039	
33180.0	0.02908	
38090.0	0.02773	
43720.0	0.02634	
50180.0	0.02493	
57600.0	0.02351	
66120.0	0.02211	
75900.0	0.02072	
87120.0	0.01935	
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