Sputtering of Xe+ on Hf(pc) at 300 K
Sputtering of Xe+ on Hf(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 32.77 | 0.0 | |
| 38.59 | 0.0001097 | |
| 45.46 | 0.0006373 | |
| 53.55 | 0.002053 | |
| 63.08 | 0.005184 | |
| 74.3 | 0.01141 | |
| 87.52 | 0.02288 | |
| 103.1 | 0.04259 | |
| 121.4 | 0.07418 | |
| 143.0 | 0.1211 | |
| 168.5 | 0.1853 | |
| 198.5 | 0.2659 | |
| 233.8 | 0.3594 | |
| 275.4 | 0.4612 | |
| 324.3 | 0.5672 | |
| 382.1 | 0.675 | |
| 450.0 | 0.784 | |
| 530.1 | 0.8947 | |
| 624.4 | 1.008 | |
| 735.5 | 1.126 | |
| 866.3 | 1.25 | |
| 1020.0 | 1.38 | |
| 1202.0 | 1.518 | |
| 1416.0 | 1.664 | |
| 1668.0 | 1.82 | |
| 1965.0 | 1.985 | |
| 2314.0 | 2.161 | |
| 2726.0 | 2.347 | |
| 3211.0 | 2.543 | |
| 3782.0 | 2.751 | |
| 4455.0 | 2.969 | |
| 5247.0 | 3.198 | |
| 6181.0 | 3.436 | |
| 7281.0 | 3.685 | |
| 8576.0 | 3.942 | |
| 10100.0 | 4.208 | |
| 11900.0 | 4.481 | |
| 14020.0 | 4.761 | |
| 16510.0 | 5.046 | |
| 19450.0 | 5.335 | |
| 22910.0 | 5.626 | |
| 26980.0 | 5.918 | |
| 31780.0 | 6.209 | |
| 37440.0 | 6.497 | |
| 44100.0 | 6.78 | |
| 51950.0 | 7.056 | |
| 61190.0 | 7.323 | |
| 72070.0 | 7.578 | |
| 84900.0 | 7.819 |
E = 32.77 – 100000