{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Hf", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Xe+ on Hf(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1218, "q": 22.78, "mu": 2.054, "epsilonL": 8.578e-07, "Eth": 32.77}, "E_min": 32.77, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
32.77	0.0	
38.59	0.0001097	
45.46	0.0006373	
53.55	0.002053	
63.08	0.005184	
74.3	0.01141	
87.52	0.02288	
103.1	0.04259	
121.4	0.07418	
143.0	0.1211	
168.5	0.1853	
198.5	0.2659	
233.8	0.3594	
275.4	0.4612	
324.3	0.5672	
382.1	0.675	
450.0	0.784	
530.1	0.8947	
624.4	1.008	
735.5	1.126	
866.3	1.25	
1020.0	1.38	
1202.0	1.518	
1416.0	1.664	
1668.0	1.82	
1965.0	1.985	
2314.0	2.161	
2726.0	2.347	
3211.0	2.543	
3782.0	2.751	
4455.0	2.969	
5247.0	3.198	
6181.0	3.436	
7281.0	3.685	
8576.0	3.942	
10100.0	4.208	
11900.0	4.481	
14020.0	4.761	
16510.0	5.046	
19450.0	5.335	
22910.0	5.626	
26980.0	5.918	
31780.0	6.209	
37440.0	6.497	
44100.0	6.78	
51950.0	7.056	
61190.0	7.323	
72070.0	7.578	
84900.0	7.819	
-----