Sputtering of T+ on Hf(pc) at 300 K
Sputtering of T+ on Hf(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
112.3 | 1.349e-24 | |
129.0 | 0.0001339 | |
148.1 | 0.0004192 | |
170.2 | 0.0008809 | |
195.5 | 0.001556 | |
224.5 | 0.002474 | |
257.9 | 0.003641 | |
296.3 | 0.005035 | |
340.3 | 0.006597 | |
390.9 | 0.008249 | |
449.0 | 0.009901 | |
515.8 | 0.01148 | |
592.5 | 0.01292 | |
680.6 | 0.01421 | |
781.8 | 0.01533 | |
898.0 | 0.01629 | |
1031.0 | 0.0171 | |
1185.0 | 0.01778 | |
1361.0 | 0.01833 | |
1563.0 | 0.01878 | |
1796.0 | 0.01913 | |
2063.0 | 0.01938 | |
2369.0 | 0.01956 | |
2722.0 | 0.01965 | |
3126.0 | 0.01967 | |
3591.0 | 0.01961 | |
4125.0 | 0.01948 | |
4739.0 | 0.01927 | |
5443.0 | 0.019 | |
6252.0 | 0.01865 | |
7182.0 | 0.01825 | |
8250.0 | 0.01778 | |
9476.0 | 0.01726 | |
10890.0 | 0.01669 | |
12500.0 | 0.01607 | |
14360.0 | 0.01542 | |
16500.0 | 0.01474 | |
18950.0 | 0.01404 | |
21770.0 | 0.01332 | |
25000.0 | 0.01259 | |
28720.0 | 0.01186 | |
32990.0 | 0.01114 | |
37900.0 | 0.01043 | |
43530.0 | 0.00973 | |
50000.0 | 0.009053 | |
57440.0 | 0.008399 | |
65980.0 | 0.007772 | |
75790.0 | 0.007173 | |
87060.0 | 0.006605 |
E = 112.3 – 100000