{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Hf", "surface_phase": "pc", "species": {"text": "T+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of T+ on Hf(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2352, "q": 0.0507, "mu": 1.345, "epsilonL": 0.0001039, "Eth": 112.3}, "E_min": 112.3, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
112.3	1.349e-24	
129.0	0.0001339	
148.1	0.0004192	
170.2	0.0008809	
195.5	0.001556	
224.5	0.002474	
257.9	0.003641	
296.3	0.005035	
340.3	0.006597	
390.9	0.008249	
449.0	0.009901	
515.8	0.01148	
592.5	0.01292	
680.6	0.01421	
781.8	0.01533	
898.0	0.01629	
1031.0	0.0171	
1185.0	0.01778	
1361.0	0.01833	
1563.0	0.01878	
1796.0	0.01913	
2063.0	0.01938	
2369.0	0.01956	
2722.0	0.01965	
3126.0	0.01967	
3591.0	0.01961	
4125.0	0.01948	
4739.0	0.01927	
5443.0	0.019	
6252.0	0.01865	
7182.0	0.01825	
8250.0	0.01778	
9476.0	0.01726	
10890.0	0.01669	
12500.0	0.01607	
14360.0	0.01542	
16500.0	0.01474	
18950.0	0.01404	
21770.0	0.01332	
25000.0	0.01259	
28720.0	0.01186	
32990.0	0.01114	
37900.0	0.01043	
43530.0	0.00973	
50000.0	0.009053	
57440.0	0.008399	
65980.0	0.007772	
75790.0	0.007173	
87060.0	0.006605	
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