Sputtering of N+ on Ti(pc) at 300 K
Sputtering of N+ on Ti(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
16.54 | 0.0 | |
19.76 | 0.0001646 | |
23.6 | 0.000963 | |
28.19 | 0.003132 | |
33.67 | 0.00794 | |
40.22 | 0.01732 | |
48.04 | 0.03366 | |
57.38 | 0.059 | |
68.54 | 0.09355 | |
81.86 | 0.1349 | |
97.78 | 0.1788 | |
116.8 | 0.2216 | |
139.5 | 0.2611 | |
166.6 | 0.297 | |
199.0 | 0.3298 | |
237.8 | 0.3604 | |
284.0 | 0.3893 | |
339.2 | 0.4171 | |
405.2 | 0.4442 | |
484.0 | 0.4708 | |
578.1 | 0.4967 | |
690.5 | 0.5221 | |
824.8 | 0.5468 | |
985.2 | 0.5707 | |
1177.0 | 0.5935 | |
1406.0 | 0.6151 | |
1679.0 | 0.6351 | |
2005.0 | 0.6534 | |
2395.0 | 0.6696 | |
2861.0 | 0.6836 | |
3418.0 | 0.6949 | |
4082.0 | 0.7033 | |
4876.0 | 0.7086 | |
5824.0 | 0.7105 | |
6957.0 | 0.7089 | |
8310.0 | 0.7034 | |
9926.0 | 0.6942 | |
11860.0 | 0.6811 | |
14160.0 | 0.6643 | |
16920.0 | 0.644 | |
20200.0 | 0.6204 | |
24130.0 | 0.5939 | |
28830.0 | 0.565 | |
34430.0 | 0.5341 | |
41130.0 | 0.5019 | |
49130.0 | 0.4687 | |
58680.0 | 0.4352 | |
70090.0 | 0.4019 | |
83720.0 | 0.3692 |
E = 16.54 – 100000