Sputtering of N+ on Ti(pc) at 300 K
Sputtering of N+ on Ti(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 16.54 | 0.0 | |
| 19.76 | 0.0001646 | |
| 23.6 | 0.000963 | |
| 28.19 | 0.003132 | |
| 33.67 | 0.00794 | |
| 40.22 | 0.01732 | |
| 48.04 | 0.03366 | |
| 57.38 | 0.059 | |
| 68.54 | 0.09355 | |
| 81.86 | 0.1349 | |
| 97.78 | 0.1788 | |
| 116.8 | 0.2216 | |
| 139.5 | 0.2611 | |
| 166.6 | 0.297 | |
| 199.0 | 0.3298 | |
| 237.8 | 0.3604 | |
| 284.0 | 0.3893 | |
| 339.2 | 0.4171 | |
| 405.2 | 0.4442 | |
| 484.0 | 0.4708 | |
| 578.1 | 0.4967 | |
| 690.5 | 0.5221 | |
| 824.8 | 0.5468 | |
| 985.2 | 0.5707 | |
| 1177.0 | 0.5935 | |
| 1406.0 | 0.6151 | |
| 1679.0 | 0.6351 | |
| 2005.0 | 0.6534 | |
| 2395.0 | 0.6696 | |
| 2861.0 | 0.6836 | |
| 3418.0 | 0.6949 | |
| 4082.0 | 0.7033 | |
| 4876.0 | 0.7086 | |
| 5824.0 | 0.7105 | |
| 6957.0 | 0.7089 | |
| 8310.0 | 0.7034 | |
| 9926.0 | 0.6942 | |
| 11860.0 | 0.6811 | |
| 14160.0 | 0.6643 | |
| 16920.0 | 0.644 | |
| 20200.0 | 0.6204 | |
| 24130.0 | 0.5939 | |
| 28830.0 | 0.565 | |
| 34430.0 | 0.5341 | |
| 41130.0 | 0.5019 | |
| 49130.0 | 0.4687 | |
| 58680.0 | 0.4352 | |
| 70090.0 | 0.4019 | |
| 83720.0 | 0.3692 |
E = 16.54 – 100000