Sputtering of 4He+ on Ti(pc) at 300 K
Sputtering of 4He+ on Ti(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
24.54 | 0.0 | |
29.07 | 0.0002479 | |
34.45 | 0.001028 | |
40.82 | 0.002621 | |
48.36 | 0.005382 | |
57.3 | 0.009608 | |
67.9 | 0.01537 | |
80.45 | 0.02236 | |
95.33 | 0.02997 | |
113.0 | 0.0375 | |
133.8 | 0.04444 | |
158.6 | 0.05053 | |
187.9 | 0.05575 | |
222.6 | 0.06019 | |
263.8 | 0.06397 | |
312.6 | 0.06721 | |
370.4 | 0.06999 | |
438.9 | 0.07239 | |
520.0 | 0.07442 | |
616.1 | 0.07613 | |
730.0 | 0.0775 | |
865.0 | 0.07853 | |
1025.0 | 0.07921 | |
1214.0 | 0.07953 | |
1439.0 | 0.07948 | |
1705.0 | 0.07903 | |
2020.0 | 0.07819 | |
2394.0 | 0.07696 | |
2836.0 | 0.07534 | |
3361.0 | 0.07334 | |
3982.0 | 0.07099 | |
4719.0 | 0.06833 | |
5591.0 | 0.06538 | |
6625.0 | 0.06221 | |
7849.0 | 0.05886 | |
9301.0 | 0.05537 | |
11020.0 | 0.05182 | |
13060.0 | 0.04823 | |
15470.0 | 0.04468 | |
18330.0 | 0.04118 | |
21720.0 | 0.03779 | |
25740.0 | 0.03452 | |
30500.0 | 0.03141 | |
36140.0 | 0.02848 | |
42820.0 | 0.02572 | |
50730.0 | 0.02315 | |
60110.0 | 0.02078 | |
71230.0 | 0.01859 | |
84400.0 | 0.01659 |
E = 24.54 – 100000