Sputtering of 4He+ on Ti(pc) at 300 K
Sputtering of 4He+ on Ti(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 24.54 | 0.0 | |
| 29.07 | 0.0002479 | |
| 34.45 | 0.001028 | |
| 40.82 | 0.002621 | |
| 48.36 | 0.005382 | |
| 57.3 | 0.009608 | |
| 67.9 | 0.01537 | |
| 80.45 | 0.02236 | |
| 95.33 | 0.02997 | |
| 113.0 | 0.0375 | |
| 133.8 | 0.04444 | |
| 158.6 | 0.05053 | |
| 187.9 | 0.05575 | |
| 222.6 | 0.06019 | |
| 263.8 | 0.06397 | |
| 312.6 | 0.06721 | |
| 370.4 | 0.06999 | |
| 438.9 | 0.07239 | |
| 520.0 | 0.07442 | |
| 616.1 | 0.07613 | |
| 730.0 | 0.0775 | |
| 865.0 | 0.07853 | |
| 1025.0 | 0.07921 | |
| 1214.0 | 0.07953 | |
| 1439.0 | 0.07948 | |
| 1705.0 | 0.07903 | |
| 2020.0 | 0.07819 | |
| 2394.0 | 0.07696 | |
| 2836.0 | 0.07534 | |
| 3361.0 | 0.07334 | |
| 3982.0 | 0.07099 | |
| 4719.0 | 0.06833 | |
| 5591.0 | 0.06538 | |
| 6625.0 | 0.06221 | |
| 7849.0 | 0.05886 | |
| 9301.0 | 0.05537 | |
| 11020.0 | 0.05182 | |
| 13060.0 | 0.04823 | |
| 15470.0 | 0.04468 | |
| 18330.0 | 0.04118 | |
| 21720.0 | 0.03779 | |
| 25740.0 | 0.03452 | |
| 30500.0 | 0.03141 | |
| 36140.0 | 0.02848 | |
| 42820.0 | 0.02572 | |
| 50730.0 | 0.02315 | |
| 60110.0 | 0.02078 | |
| 71230.0 | 0.01859 | |
| 84400.0 | 0.01659 |
E = 24.54 – 100000