{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ti", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of (4He)+ on Ti(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.2053, "q": 0.2036, "mu": 1.631, "epsilonL": 0.0002221, "Eth": 24.54}, "E_min": 24.54, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
24.54	0.0	
29.07	0.0002479	
34.45	0.001028	
40.82	0.002621	
48.36	0.005382	
57.3	0.009608	
67.9	0.01537	
80.45	0.02236	
95.33	0.02997	
113.0	0.0375	
133.8	0.04444	
158.6	0.05053	
187.9	0.05575	
222.6	0.06019	
263.8	0.06397	
312.6	0.06721	
370.4	0.06999	
438.9	0.07239	
520.0	0.07442	
616.1	0.07613	
730.0	0.0775	
865.0	0.07853	
1025.0	0.07921	
1214.0	0.07953	
1439.0	0.07948	
1705.0	0.07903	
2020.0	0.07819	
2394.0	0.07696	
2836.0	0.07534	
3361.0	0.07334	
3982.0	0.07099	
4719.0	0.06833	
5591.0	0.06538	
6625.0	0.06221	
7849.0	0.05886	
9301.0	0.05537	
11020.0	0.05182	
13060.0	0.04823	
15470.0	0.04468	
18330.0	0.04118	
21720.0	0.03779	
25740.0	0.03452	
30500.0	0.03141	
36140.0	0.02848	
42820.0	0.02572	
50730.0	0.02315	
60110.0	0.02078	
71230.0	0.01859	
84400.0	0.01659	
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