Sputtering of H+ on Ti(pc) at 300 K
Sputtering of H+ on Ti(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 77.18 | 0.0 | |
| 89.33 | 0.0001483 | |
| 103.4 | 0.0003426 | |
| 119.7 | 0.0005987 | |
| 138.5 | 0.0009269 | |
| 160.4 | 0.001334 | |
| 185.6 | 0.00182 | |
| 214.8 | 0.002378 | |
| 248.7 | 0.002992 | |
| 287.9 | 0.003639 | |
| 333.2 | 0.00429 | |
| 385.7 | 0.004915 | |
| 446.4 | 0.005489 | |
| 516.7 | 0.005992 | |
| 598.1 | 0.006411 | |
| 692.3 | 0.006742 | |
| 801.3 | 0.006985 | |
| 927.5 | 0.007144 | |
| 1074.0 | 0.007226 | |
| 1243.0 | 0.007238 | |
| 1438.0 | 0.007188 | |
| 1665.0 | 0.007084 | |
| 1927.0 | 0.006934 | |
| 2231.0 | 0.006744 | |
| 2582.0 | 0.006521 | |
| 2989.0 | 0.006271 | |
| 3460.0 | 0.006 | |
| 4004.0 | 0.005712 | |
| 4635.0 | 0.005414 | |
| 5365.0 | 0.005109 | |
| 6210.0 | 0.004801 | |
| 7188.0 | 0.004494 | |
| 8320.0 | 0.004191 | |
| 9631.0 | 0.003894 | |
| 11150.0 | 0.003607 | |
| 12900.0 | 0.00333 | |
| 14940.0 | 0.003065 | |
| 17290.0 | 0.002814 | |
| 20010.0 | 0.002576 | |
| 23160.0 | 0.002353 | |
| 26810.0 | 0.002144 | |
| 31030.0 | 0.001949 | |
| 35920.0 | 0.001768 | |
| 41580.0 | 0.001601 | |
| 48130.0 | 0.001447 | |
| 55710.0 | 0.001305 | |
| 64480.0 | 0.001176 | |
| 74640.0 | 0.001058 | |
| 86390.0 | 0.0009499 |
E = 77.18 – 100000