Sputtering of H+ on Ti(pc) at 300 K
Sputtering of H+ on Ti(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
77.18 | 0.0 | |
89.33 | 0.0001483 | |
103.4 | 0.0003426 | |
119.7 | 0.0005987 | |
138.5 | 0.0009269 | |
160.4 | 0.001334 | |
185.6 | 0.00182 | |
214.8 | 0.002378 | |
248.7 | 0.002992 | |
287.9 | 0.003639 | |
333.2 | 0.00429 | |
385.7 | 0.004915 | |
446.4 | 0.005489 | |
516.7 | 0.005992 | |
598.1 | 0.006411 | |
692.3 | 0.006742 | |
801.3 | 0.006985 | |
927.5 | 0.007144 | |
1074.0 | 0.007226 | |
1243.0 | 0.007238 | |
1438.0 | 0.007188 | |
1665.0 | 0.007084 | |
1927.0 | 0.006934 | |
2231.0 | 0.006744 | |
2582.0 | 0.006521 | |
2989.0 | 0.006271 | |
3460.0 | 0.006 | |
4004.0 | 0.005712 | |
4635.0 | 0.005414 | |
5365.0 | 0.005109 | |
6210.0 | 0.004801 | |
7188.0 | 0.004494 | |
8320.0 | 0.004191 | |
9631.0 | 0.003894 | |
11150.0 | 0.003607 | |
12900.0 | 0.00333 | |
14940.0 | 0.003065 | |
17290.0 | 0.002814 | |
20010.0 | 0.002576 | |
23160.0 | 0.002353 | |
26810.0 | 0.002144 | |
31030.0 | 0.001949 | |
35920.0 | 0.001768 | |
41580.0 | 0.001601 | |
48130.0 | 0.001447 | |
55710.0 | 0.001305 | |
64480.0 | 0.001176 | |
74640.0 | 0.001058 | |
86390.0 | 0.0009499 |
E = 77.18 – 100000