{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ti", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of H+ on Ti(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.6214, "q": 0.0207, "mu": 0.9427, "epsilonL": 0.0004868, "Eth": 77.18}, "E_min": 77.18, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
77.18	0.0	
89.33	0.0001483	
103.4	0.0003426	
119.7	0.0005987	
138.5	0.0009269	
160.4	0.001334	
185.6	0.00182	
214.8	0.002378	
248.7	0.002992	
287.9	0.003639	
333.2	0.00429	
385.7	0.004915	
446.4	0.005489	
516.7	0.005992	
598.1	0.006411	
692.3	0.006742	
801.3	0.006985	
927.5	0.007144	
1074.0	0.007226	
1243.0	0.007238	
1438.0	0.007188	
1665.0	0.007084	
1927.0	0.006934	
2231.0	0.006744	
2582.0	0.006521	
2989.0	0.006271	
3460.0	0.006	
4004.0	0.005712	
4635.0	0.005414	
5365.0	0.005109	
6210.0	0.004801	
7188.0	0.004494	
8320.0	0.004191	
9631.0	0.003894	
11150.0	0.003607	
12900.0	0.00333	
14940.0	0.003065	
17290.0	0.002814	
20010.0	0.002576	
23160.0	0.002353	
26810.0	0.002144	
31030.0	0.001949	
35920.0	0.001768	
41580.0	0.001601	
48130.0	0.001447	
55710.0	0.001305	
64480.0	0.001176	
74640.0	0.001058	
86390.0	0.0009499	
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