Sputtering of Kr+ on Si(pc) at 300 K
Sputtering of Kr+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 39.58 | 0.0 | |
| 46.44 | 0.000109 | |
| 54.5 | 0.000502 | |
| 63.95 | 0.001394 | |
| 75.03 | 0.003144 | |
| 88.04 | 0.006321 | |
| 103.3 | 0.01178 | |
| 121.2 | 0.02077 | |
| 142.2 | 0.03493 | |
| 166.9 | 0.05627 | |
| 195.8 | 0.08687 | |
| 229.8 | 0.1284 | |
| 269.6 | 0.1814 | |
| 316.4 | 0.2449 | |
| 371.2 | 0.3167 | |
| 435.6 | 0.3936 | |
| 511.1 | 0.4726 | |
| 599.7 | 0.5518 | |
| 703.7 | 0.6299 | |
| 825.7 | 0.7066 | |
| 968.9 | 0.7821 | |
| 1137.0 | 0.857 | |
| 1334.0 | 0.9316 | |
| 1565.0 | 1.007 | |
| 1837.0 | 1.082 | |
| 2155.0 | 1.159 | |
| 2529.0 | 1.236 | |
| 2967.0 | 1.314 | |
| 3482.0 | 1.393 | |
| 4085.0 | 1.473 | |
| 4794.0 | 1.553 | |
| 5625.0 | 1.634 | |
| 6600.0 | 1.714 | |
| 7744.0 | 1.793 | |
| 9087.0 | 1.871 | |
| 10660.0 | 1.947 | |
| 12510.0 | 2.021 | |
| 14680.0 | 2.092 | |
| 17230.0 | 2.159 | |
| 20210.0 | 2.222 | |
| 23720.0 | 2.28 | |
| 27830.0 | 2.333 | |
| 32650.0 | 2.379 | |
| 38310.0 | 2.418 | |
| 44960.0 | 2.449 | |
| 52750.0 | 2.472 | |
| 61900.0 | 2.486 | |
| 72630.0 | 2.49 | |
| 85220.0 | 2.483 |
E = 39.58 – 100000