Sputtering of Si+ on Si(pc) at 300 K
Sputtering of Si+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 20.03 | 0.0 | |
| 23.84 | 7.684e-05 | |
| 28.36 | 0.0003621 | |
| 33.75 | 0.001031 | |
| 40.15 | 0.002389 | |
| 47.77 | 0.00494 | |
| 56.84 | 0.009475 | |
| 67.62 | 0.01717 | |
| 80.46 | 0.02965 | |
| 95.73 | 0.04888 | |
| 113.9 | 0.07683 | |
| 135.5 | 0.1148 | |
| 161.2 | 0.1624 | |
| 191.8 | 0.2178 | |
| 228.3 | 0.2774 | |
| 271.6 | 0.3378 | |
| 323.1 | 0.3963 | |
| 384.5 | 0.4515 | |
| 457.4 | 0.503 | |
| 544.2 | 0.5513 | |
| 647.5 | 0.5968 | |
| 770.4 | 0.6401 | |
| 916.7 | 0.6816 | |
| 1091.0 | 0.7216 | |
| 1298.0 | 0.7602 | |
| 1544.0 | 0.7975 | |
| 1837.0 | 0.8333 | |
| 2186.0 | 0.8674 | |
| 2600.0 | 0.8998 | |
| 3094.0 | 0.93 | |
| 3681.0 | 0.9578 | |
| 4380.0 | 0.9828 | |
| 5211.0 | 1.005 | |
| 6200.0 | 1.023 | |
| 7377.0 | 1.037 | |
| 8777.0 | 1.048 | |
| 10440.0 | 1.053 | |
| 12430.0 | 1.054 | |
| 14780.0 | 1.049 | |
| 17590.0 | 1.039 | |
| 20930.0 | 1.024 | |
| 24900.0 | 1.003 | |
| 29630.0 | 0.9766 | |
| 35250.0 | 0.9456 | |
| 41940.0 | 0.9101 | |
| 49900.0 | 0.8707 | |
| 59370.0 | 0.828 | |
| 70640.0 | 0.7827 | |
| 84050.0 | 0.7356 |
E = 20.04 – 100000