Sputtering of Si+ on Si(pc) at 300 K
Sputtering of Si+ on Si(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
20.03 | 0.0 | |
23.84 | 7.684e-05 | |
28.36 | 0.0003621 | |
33.75 | 0.001031 | |
40.15 | 0.002389 | |
47.77 | 0.00494 | |
56.84 | 0.009475 | |
67.62 | 0.01717 | |
80.46 | 0.02965 | |
95.73 | 0.04888 | |
113.9 | 0.07683 | |
135.5 | 0.1148 | |
161.2 | 0.1624 | |
191.8 | 0.2178 | |
228.3 | 0.2774 | |
271.6 | 0.3378 | |
323.1 | 0.3963 | |
384.5 | 0.4515 | |
457.4 | 0.503 | |
544.2 | 0.5513 | |
647.5 | 0.5968 | |
770.4 | 0.6401 | |
916.7 | 0.6816 | |
1091.0 | 0.7216 | |
1298.0 | 0.7602 | |
1544.0 | 0.7975 | |
1837.0 | 0.8333 | |
2186.0 | 0.8674 | |
2600.0 | 0.8998 | |
3094.0 | 0.93 | |
3681.0 | 0.9578 | |
4380.0 | 0.9828 | |
5211.0 | 1.005 | |
6200.0 | 1.023 | |
7377.0 | 1.037 | |
8777.0 | 1.048 | |
10440.0 | 1.053 | |
12430.0 | 1.054 | |
14780.0 | 1.049 | |
17590.0 | 1.039 | |
20930.0 | 1.024 | |
24900.0 | 1.003 | |
29630.0 | 0.9766 | |
35250.0 | 0.9456 | |
41940.0 | 0.9101 | |
49900.0 | 0.8707 | |
59370.0 | 0.828 | |
70640.0 | 0.7827 | |
84050.0 | 0.7356 |
E = 20.04 – 100000