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Plasma-Surface Interaction Data Set 211

Sputtering of ⁴He⁺ on Si(pc) at 300 K

B144: W. Eckstein, "Sputtering Yields. In: Sputtering by Particle Bombardment", Topics in Applied Physics 110 (2007). [https://doi.org/10.1007/978-3-540-44502-9_3]

Sputtering of ⁴He⁺ on Si(pc) at 300 K

angle = 0.0 deg	E /eV	P
	18.9	3.454e-26
	22.51	0.0004093
	26.82	0.00151
	31.95	0.003591
	38.05	0.007017
	45.33	0.01209
	54.0	0.01887
	64.32	0.02707
	76.62	0.03605
	91.28	0.04504
	108.7	0.05341
	129.5	0.06082
	154.3	0.06715
	183.8	0.07245
	218.9	0.07686
	260.8	0.0805
	310.7	0.08349
	370.1	0.08589
	440.8	0.08776
	525.1	0.08913
	625.5	0.09002
	745.2	0.09041
	887.7	0.09032
	1057.0	0.08973
	1260.0	0.08865
	1500.0	0.08708
	1787.0	0.08504
	2129.0	0.08254
	2536.0	0.07964
	3021.0	0.07637
	3599.0	0.07278
	4287.0	0.06894
	5107.0	0.06492
	6083.0	0.06077
	7247.0	0.05657
	8632.0	0.05237
	10280.0	0.04824
	12250.0	0.04421
	14590.0	0.04033
	17380.0	0.03662
	20710.0	0.03313
	24660.0	0.02985
	29380.0	0.02679
	35000.0	0.02397
	41690.0	0.02138
	49660.0	0.01902
	59160.0	0.01687
	70470.0	0.01492
	83950.0	0.01317

Fit Function: SPTEEX

\[Y(E) = \frac{q}{2} \frac{\left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \ln(1 + 1.2288\epsilon)}{\lambda + \left( \frac{E}{E_\mathrm{th}} - 1 \right)^\mu \left[ \epsilon + 0.1728\sqrt{\epsilon} + 0.008\epsilon^{0.1504} \right]}\]

Coefficients

lambda = 0.2524
q = 0.2319
mu = 1.473
epsilonL = 0.000374
Eth = 18.9

Fit range

E = 18.9 – 100000