Sputtering of 3He+ on Si(pc) at 300 K
Sputtering of 3He+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 21.41 | 0.0 | |
| 25.43 | 0.0003432 | |
| 30.22 | 0.001188 | |
| 35.91 | 0.002718 | |
| 42.66 | 0.00518 | |
| 50.69 | 0.008798 | |
| 60.23 | 0.01368 | |
| 71.57 | 0.0197 | |
| 85.04 | 0.02651 | |
| 101.0 | 0.03358 | |
| 120.1 | 0.0404 | |
| 142.7 | 0.0466 | |
| 169.5 | 0.05199 | |
| 201.4 | 0.05653 | |
| 239.3 | 0.06029 | |
| 284.3 | 0.06336 | |
| 337.8 | 0.06581 | |
| 401.4 | 0.06773 | |
| 477.0 | 0.06917 | |
| 566.7 | 0.07016 | |
| 673.4 | 0.07074 | |
| 800.1 | 0.0709 | |
| 950.7 | 0.07066 | |
| 1130.0 | 0.07003 | |
| 1342.0 | 0.06901 | |
| 1595.0 | 0.06762 | |
| 1895.0 | 0.06587 | |
| 2252.0 | 0.06378 | |
| 2675.0 | 0.06139 | |
| 3179.0 | 0.05874 | |
| 3777.0 | 0.05587 | |
| 4488.0 | 0.05282 | |
| 5332.0 | 0.04966 | |
| 6336.0 | 0.04642 | |
| 7528.0 | 0.04316 | |
| 8945.0 | 0.03993 | |
| 10630.0 | 0.03675 | |
| 12630.0 | 0.03366 | |
| 15010.0 | 0.0307 | |
| 17830.0 | 0.02789 | |
| 21180.0 | 0.02523 | |
| 25170.0 | 0.02274 | |
| 29910.0 | 0.02043 | |
| 35540.0 | 0.01829 | |
| 42220.0 | 0.01633 | |
| 50170.0 | 0.01454 | |
| 59610.0 | 0.01291 | |
| 70830.0 | 0.01144 | |
| 84160.0 | 0.01011 |
E = 21.41 – 100000