Sputtering of 3He+ on Si(pc) at 300 K
Sputtering of 3He+ on Si(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
21.41 | 0.0 | |
25.43 | 0.0003432 | |
30.22 | 0.001188 | |
35.91 | 0.002718 | |
42.66 | 0.00518 | |
50.69 | 0.008798 | |
60.23 | 0.01368 | |
71.57 | 0.0197 | |
85.04 | 0.02651 | |
101.0 | 0.03358 | |
120.1 | 0.0404 | |
142.7 | 0.0466 | |
169.5 | 0.05199 | |
201.4 | 0.05653 | |
239.3 | 0.06029 | |
284.3 | 0.06336 | |
337.8 | 0.06581 | |
401.4 | 0.06773 | |
477.0 | 0.06917 | |
566.7 | 0.07016 | |
673.4 | 0.07074 | |
800.1 | 0.0709 | |
950.7 | 0.07066 | |
1130.0 | 0.07003 | |
1342.0 | 0.06901 | |
1595.0 | 0.06762 | |
1895.0 | 0.06587 | |
2252.0 | 0.06378 | |
2675.0 | 0.06139 | |
3179.0 | 0.05874 | |
3777.0 | 0.05587 | |
4488.0 | 0.05282 | |
5332.0 | 0.04966 | |
6336.0 | 0.04642 | |
7528.0 | 0.04316 | |
8945.0 | 0.03993 | |
10630.0 | 0.03675 | |
12630.0 | 0.03366 | |
15010.0 | 0.0307 | |
17830.0 | 0.02789 | |
21180.0 | 0.02523 | |
25170.0 | 0.02274 | |
29910.0 | 0.02043 | |
35540.0 | 0.01829 | |
42220.0 | 0.01633 | |
50170.0 | 0.01454 | |
59610.0 | 0.01291 | |
70830.0 | 0.01144 | |
84160.0 | 0.01011 |
E = 21.41 – 100000