Sputtering of D+ on Si(pc) at 300 K
Sputtering of D+ on Si(pc) at 300 K
| angle = 0.0 deg | E /eV | P |
|---|---|---|
| 24.54 | 0.0 | |
| 29.08 | 9.527e-05 | |
| 34.46 | 0.0004021 | |
| 40.83 | 0.001038 | |
| 48.38 | 0.002147 | |
| 57.32 | 0.003849 | |
| 67.92 | 0.006147 | |
| 80.47 | 0.008871 | |
| 95.35 | 0.01171 | |
| 113.0 | 0.01436 | |
| 133.9 | 0.0166 | |
| 158.6 | 0.01836 | |
| 187.9 | 0.01969 | |
| 222.7 | 0.02064 | |
| 263.9 | 0.02129 | |
| 312.6 | 0.02169 | |
| 370.4 | 0.02188 | |
| 438.9 | 0.02191 | |
| 520.1 | 0.02178 | |
| 616.2 | 0.02151 | |
| 730.2 | 0.02111 | |
| 865.2 | 0.02059 | |
| 1025.0 | 0.01997 | |
| 1215.0 | 0.01925 | |
| 1439.0 | 0.01845 | |
| 1705.0 | 0.01758 | |
| 2021.0 | 0.01666 | |
| 2394.0 | 0.01569 | |
| 2837.0 | 0.0147 | |
| 3361.0 | 0.0137 | |
| 3983.0 | 0.0127 | |
| 4719.0 | 0.01172 | |
| 5591.0 | 0.01077 | |
| 6625.0 | 0.009847 | |
| 7850.0 | 0.008968 | |
| 9301.0 | 0.008136 | |
| 11020.0 | 0.007354 | |
| 13060.0 | 0.006625 | |
| 15470.0 | 0.00595 | |
| 18330.0 | 0.005327 | |
| 21720.0 | 0.004757 | |
| 25740.0 | 0.004236 | |
| 30500.0 | 0.003764 | |
| 36140.0 | 0.003337 | |
| 42820.0 | 0.002952 | |
| 50730.0 | 0.002606 | |
| 60110.0 | 0.002297 | |
| 71230.0 | 0.002021 | |
| 84400.0 | 0.001775 |
E = 24.54 – 100000