Sputtering of D+ on Si(pc) at 300 K
Sputtering of D+ on Si(pc) at 300 K
angle = 0.0 deg | E /eV | P |
---|---|---|
24.54 | 0.0 | |
29.08 | 9.527e-05 | |
34.46 | 0.0004021 | |
40.83 | 0.001038 | |
48.38 | 0.002147 | |
57.32 | 0.003849 | |
67.92 | 0.006147 | |
80.47 | 0.008871 | |
95.35 | 0.01171 | |
113.0 | 0.01436 | |
133.9 | 0.0166 | |
158.6 | 0.01836 | |
187.9 | 0.01969 | |
222.7 | 0.02064 | |
263.9 | 0.02129 | |
312.6 | 0.02169 | |
370.4 | 0.02188 | |
438.9 | 0.02191 | |
520.1 | 0.02178 | |
616.2 | 0.02151 | |
730.2 | 0.02111 | |
865.2 | 0.02059 | |
1025.0 | 0.01997 | |
1215.0 | 0.01925 | |
1439.0 | 0.01845 | |
1705.0 | 0.01758 | |
2021.0 | 0.01666 | |
2394.0 | 0.01569 | |
2837.0 | 0.0147 | |
3361.0 | 0.0137 | |
3983.0 | 0.0127 | |
4719.0 | 0.01172 | |
5591.0 | 0.01077 | |
6625.0 | 0.009847 | |
7850.0 | 0.008968 | |
9301.0 | 0.008136 | |
11020.0 | 0.007354 | |
13060.0 | 0.006625 | |
15470.0 | 0.00595 | |
18330.0 | 0.005327 | |
21720.0 | 0.004757 | |
25740.0 | 0.004236 | |
30500.0 | 0.003764 | |
36140.0 | 0.003337 | |
42820.0 | 0.002952 | |
50730.0 | 0.002606 | |
60110.0 | 0.002297 | |
71230.0 | 0.002021 | |
84400.0 | 0.001775 |
E = 24.54 – 100000