{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "LiOH", "surface_phase": "a", "species": {"text": "H", "charge": 0}, "temperature": 300, "comment": "", "refs": [{"id": 4, "authors": "P. S. Krstic, E. T. Ostrowski, S. Dwivedi, S. Abe, A. Maan, A. C. T. Van Duin, B. E. Koel", "title": "Detailed studies of the processes in low energy H irradiation of Li and Li-compound surfaces", "journal": "Journal of Applied Physics", "volume": "134", "page_start": "", "page_end": "", "article_number": "", "year": 2023, "note": "", "doi": "10.1063/5.0149502", "bibcode": "2023JAP...134j0902K", "url": "https://dx.doi.org/10.1063/5.0149502"}]}
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Sputtering of H on LiOH(a) at 300 K
angle = 0.0 deg
E /eV	P	unc
1.0	0.0059	0.0024
5.0	0.0059	0.0024
10.0	0.0147	0.0038
25.0	0.0435	0.0066
50.0	0.0613	0.0079
75.0	0.0624	0.0089
100.0	0.0738	0.0087
-----

angle = 85.0 deg
E /eV	P	unc
1.0	0.0061	0.0025
5.0	0.0078	0.0028
10.0	0.0137	0.0037
25.0	0.0395	0.0063
50.0	0.0467	0.0068
75.0	0.0597	0.0076
100.0	0.0695	0.0082
-----

Sputtering of H on LiOH(a) at 300 K
E = 1.0 eV
angle /deg	P	unc
0.0		0.0059	0.0024
85.0		0.0061	0.0025
-----

E = 5.0 eV
angle /deg	P	unc
0.0		0.0059	0.0024
85.0		0.0078	0.0028
-----

E = 10.0 eV
angle /deg	P	unc
0.0		0.0147	0.0038
85.0		0.0137	0.0037
-----

E = 25.0 eV
angle /deg	P	unc
0.0		0.0435	0.0066
85.0		0.0395	0.0063
-----

E = 50.0 eV
angle /deg	P	unc
0.0		0.0613	0.0079
85.0		0.0467	0.0068
-----

E = 75.0 eV
angle /deg	P	unc
0.0		0.0624	0.0089
85.0		0.0597	0.0076
-----

E = 100.0 eV
angle /deg	P	unc
0.0		0.0738	0.0087
85.0		0.0695	0.0082
-----