{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "W+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 152, "authors": "M. Saidoh, K. Sone", "title": "Low Energ Self-Sputtering Yields of Molybdenum and Tungsten", "journal": "Japanese Journal of Applied Physics", "volume": "22", "page_start": "1361", "page_end": "", "article_number": "", "year": 1983, "note": "", "doi": "10.1143/jjap.22.1361", "bibcode": "1983JaJAP..22.1361S", "url": "https://dx.doi.org/10.1143/JJAP.22.1361"}]}
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Sputtering of W+ on W(pc) at 300 K
angle = 0.0 deg
E /eV	P	
100.0	0.133	
247.0	0.2326	
477.0	0.5901	
956.0	0.7658	
1920.0	1.339	
4730.0	3.396	
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