{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "W+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 146, "authors": "E. Hechtl, A. Mazanec, W. Eckstein, J. Roth, C. Garc\u00eda-Rosales", "title": "Sputtering behavior of boron and boron carbide", "journal": "Journal of Nuclear Materials", "volume": "196-198", "page_start": "713", "page_end": "716", "article_number": "", "year": 1992, "note": "", "doi": "10.1016/S0022-3115(06)80129-7", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of W+ on W(pc) at 300 K
angle = 0.0 deg
E /eV	P	
104.0	0.03482	
151.0	0.06317	
997.0	1.111	
3010.0	2.429	
9690.0	4.408	
-----