{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "D+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 146, "authors": "E. Hechtl, A. Mazanec, W. Eckstein, J. Roth, C. Garc\u00eda-Rosales", "title": "Sputtering behavior of boron and boron carbide", "journal": "Journal of Nuclear Materials", "volume": "196-198", "page_start": "713", "page_end": "716", "article_number": "", "year": 1992, "note": "", "doi": "10.1016/S0022-3115(06)80129-7", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of D+ on W(pc) at 300 K
angle = 0.0 deg
E /eV	P	
291.0	0.0001627	
300.0	0.0002279	
305.0	0.0002898	
319.0	0.0003513	
396.0	0.001062	
506.0	0.002348	
1000.0	0.006294	
2040.0	0.009704	
5020.0	0.01043	
10000.0	0.0084	
30500.0	0.005069	
-----