{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "B", "surface_phase": "pc", "species": {"text": "D+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 146, "authors": "E. Hechtl, A. Mazanec, W. Eckstein, J. Roth, C. Garc\u00eda-Rosales", "title": "Sputtering behavior of boron and boron carbide", "journal": "Journal of Nuclear Materials", "volume": "196-198", "page_start": "713", "page_end": "716", "article_number": "", "year": 1992, "note": "", "doi": "10.1016/S0022-3115(06)80129-7", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of D+ on B(pc) at 300 K
angle = 0.0 deg
E /eV	P	
19.5	0.004516	
29.3	0.01171	
40.9	0.02467	
79.8	0.02838	
403.0	0.02947	
971.0	0.02755	
1010.0	0.03698	
1930.0	0.01699	
8020.0	0.00525	
-----