{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 156, "authors": "D. Rosenberg, G. K. Wehner", "title": "Sputtering Yields for Low Energy He+-, Kr+-, and Xe+-Ion Bombardment", "journal": "Journal of Applied Physics", "volume": "33", "page_start": "1842", "page_end": "1845", "article_number": "", "year": 1962, "note": "", "doi": "10.1063/1.1728843", "bibcode": "1962JAP....33.1842R", "url": "https://dx.doi.org/10.1063/1.1728843"}]}
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Sputtering of (4He)+ on W(pc) at 300 K
angle = 0.0 deg
E /eV	P	
200.0	0.001046	
297.0	0.00414	
400.0	0.006191	
607.0	0.008027	
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