{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 159, "authors": "E. Hechtl, J. Bohdansky, J. Roth", "title": "", "journal": "Proceedings of the Symposium on Sputtering", "volume": "", "page_start": "834", "page_end": "", "article_number": "", "year": 1980, "note": "P. Varga, G. Betz, F. P. Viehb\u00f6ck (eds), Institut Allg. Physik, TU Wien", "doi": "", "bibcode": "", "url": ""}]}
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Sputtering of (4He)+ on W(pc) at 300 K
angle = 0.0 deg
E /eV	P	
150.0	0.000469	
593.0	0.01187	
2940.0	0.03336	
-----