{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 158, "authors": "J. F. Ziegler, J. J. Cuomo, J. Roth", "title": "Reduction of ion sputtering yield by special surface microtopography", "journal": "Applied Physics Letters", "volume": "30", "page_start": "268", "page_end": "271", "article_number": "", "year": 1977, "note": "", "doi": "10.1063/1.89380", "bibcode": "1977ApPhL..30..268Z", "url": "https://dx.doi.org/10.1063/1.89380"}]}
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