{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "B", "surface_phase": "pc", "species": {"text": "(4He)+", "charge": 1}, "temperature": 300, "comment": "", "refs": [{"id": 145, "authors": "S. Miyagawa, Y. Ato, Y. Moriya", "title": "Sputtering yields of boron bombarded by light ions", "journal": "Journal of Applied Physics", "volume": "49", "page_start": "6194", "page_end": "6196", "article_number": "", "year": 1978, "note": "", "doi": "10.1063/1.324522", "bibcode": "1978JAP....49.6194M", "url": "https://dx.doi.org/10.1063/1.324522"}]}
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Sputtering of (4He)+ on B(pc) at 300 K
angle = 0.0 deg
E /eV	P	
31400.0	0.0157	
51200.0	0.009968	
70400.0	0.007662	
106000.0	0.006034	
152000.0	0.004985	
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