{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "U", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Xe+ on U(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.0694, "q": 26.96, "mu": 2.208, "epsilonL": 7.169e-07, "Eth": 25.96}, "E_min": 25.96, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
25.96	0.0	
30.72	0.0001244	
36.36	0.0008224	
43.03	0.002877	
50.93	0.007715	
60.28	0.01771	
71.34	0.03633	
84.44	0.06767	
99.93	0.115	
118.3	0.179	
140.0	0.2565	
165.7	0.3423	
196.1	0.4319	
232.1	0.5225	
274.6	0.6139	
325.1	0.7069	
384.7	0.8029	
455.3	0.9036	
538.9	1.01	
637.8	1.124	
754.8	1.247	
893.3	1.379	
1057.0	1.521	
1251.0	1.674	
1481.0	1.839	
1753.0	2.016	
2074.0	2.205	
2455.0	2.408	
2906.0	2.624	
3439.0	2.854	
4070.0	3.097	
4817.0	3.354	
5701.0	3.624	
6748.0	3.908	
7986.0	4.204	
9452.0	4.511	
11190.0	4.83	
13240.0	5.159	
15670.0	5.496	
18540.0	5.841	
21950.0	6.191	
25980.0	6.545	
30740.0	6.9	
36390.0	7.255	
43060.0	7.607	
50970.0	7.954	
60320.0	8.292	
71390.0	8.619	
84490.0	8.932	
-----