{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "U", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on U(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.5069, "q": 0.0144, "mu": 1.495, "epsilonL": 7.616e-05, "Eth": 365.6}, "E_min": 365.6, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
365.6	1.907e-27	
410.0	2.272e-05	
459.7	7.723e-05	
515.5	0.0001696	
578.0	0.0003092	
648.1	0.000506	
726.8	0.0007675	
815.0	0.001096	
913.8	0.001488	
1025.0	0.001929	
1149.0	0.0024	
1288.0	0.002877	
1445.0	0.003337	
1620.0	0.003762	
1817.0	0.004139	
2037.0	0.004463	
2284.0	0.004733	
2561.0	0.004952	
2872.0	0.005125	
3221.0	0.005257	
3612.0	0.005353	
4050.0	0.005417	
4541.0	0.005453	
5092.0	0.005465	
5710.0	0.005455	
6403.0	0.005425	
7180.0	0.005377	
8051.0	0.005312	
9028.0	0.005231	
10120.0	0.005137	
11350.0	0.00503	
12730.0	0.004911	
14270.0	0.004781	
16000.0	0.004642	
17950.0	0.004495	
20120.0	0.004341	
22570.0	0.004181	
25300.0	0.004017	
28370.0	0.003849	
31820.0	0.003679	
35680.0	0.003508	
40010.0	0.003338	
44860.0	0.003168	
50300.0	0.003001	
56410.0	0.002836	
63250.0	0.002675	
70920.0	0.002518	
79530.0	0.002366	
89180.0	0.002219	
-----