{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Th", "surface_phase": "pc", "species": {"text": "Kr+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Kr+ on Th(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.0767, "q": 16.58, "mu": 1.883, "epsilonL": 1.325e-06, "Eth": 22.9}, "E_min": 22.9, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
22.9	0.0	
27.18	0.0002022	
32.25	0.001041	
38.26	0.003114	
45.4	0.00742	
53.87	0.0155	
63.92	0.02952	
75.84	0.05205	
89.99	0.08555	
106.8	0.1315	
126.7	0.1894	
150.3	0.2573	
178.4	0.3319	
211.7	0.4106	
251.2	0.4916	
298.0	0.5744	
353.6	0.6593	
419.6	0.747	
497.8	0.8385	
590.7	0.9346	
700.9	1.036	
831.7	1.144	
986.8	1.259	
1171.0	1.381	
1389.0	1.512	
1649.0	1.65	
1956.0	1.796	
2321.0	1.951	
2754.0	2.115	
3268.0	2.287	
3877.0	2.467	
4601.0	2.654	
5459.0	2.849	
6477.0	3.051	
7686.0	3.259	
9120.0	3.471	
10820.0	3.688	
12840.0	3.908	
15230.0	4.129	
18080.0	4.351	
21450.0	4.572	
25450.0	4.79	
30200.0	5.004	
35830.0	5.212	
42520.0	5.411	
50450.0	5.6	
59860.0	5.777	
71030.0	5.939	
84280.0	6.085	
-----