{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Bi", "surface_phase": "pc", "species": {"text": "Kr+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Kr+ on Bi(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.0578, "q": 30.2, "mu": 2.056, "epsilonL": 1.421e-06, "Eth": 9.176}, "E_min": 9.176, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
9.176	2.722e-35	
11.09	0.0002019	
13.41	0.001237	
16.21	0.00418	
19.6	0.01098	
23.69	0.02475	
28.64	0.04967	
34.63	0.08989	
41.86	0.1474	
50.61	0.2206	
61.18	0.3048	
73.96	0.3953	
89.41	0.4891	
108.1	0.5856	
130.7	0.6858	
158.0	0.7913	
191.0	0.9039	
230.9	1.025	
279.1	1.157	
337.4	1.301	
407.9	1.458	
493.1	1.63	
596.1	1.816	
720.7	2.02	
871.2	2.24	
1053.0	2.479	
1273.0	2.736	
1539.0	3.012	
1861.0	3.308	
2250.0	3.623	
2720.0	3.957	
3288.0	4.31	
3975.0	4.681	
4805.0	5.069	
5809.0	5.473	
7022.0	5.89	
8489.0	6.319	
10260.0	6.758	
12410.0	7.202	
15000.0	7.651	
18130.0	8.098	
21920.0	8.542	
26500.0	8.978	
32040.0	9.402	
38730.0	9.808	
46820.0	10.19	
56600.0	10.55	
68420.0	10.87	
82720.0	11.16	
-----