{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Os", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Xe+ on Os(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1751, "q": 23.52, "mu": 2.46, "epsilonL": 8.262e-07, "Eth": 40.4}, "E_min": 40.4, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
40.4	8.556e-42	
47.39	4.306e-05	
55.58	0.0003403	
65.19	0.001329	
76.46	0.003885	
89.68	0.009652	
105.2	0.02147	
123.4	0.04373	
144.7	0.08205	
169.7	0.1416	
199.1	0.2244	
233.5	0.3264	
273.8	0.4399	
321.2	0.5568	
376.7	0.6723	
441.8	0.7852	
518.2	0.8968	
607.8	1.009	
712.9	1.124	
836.1	1.243	
980.7	1.369	
1150.0	1.502	
1349.0	1.643	
1582.0	1.793	
1856.0	1.953	
2177.0	2.123	
2553.0	2.303	
2995.0	2.493	
3512.0	2.694	
4120.0	2.906	
4832.0	3.128	
5667.0	3.36	
6647.0	3.602	
7796.0	3.854	
9144.0	4.114	
10730.0	4.383	
12580.0	4.658	
14750.0	4.94	
17300.0	5.227	
20300.0	5.517	
23810.0	5.81	
27920.0	6.104	
32750.0	6.397	
38410.0	6.686	
45050.0	6.972	
52840.0	7.25	
61980.0	7.52	
72690.0	7.778	
85260.0	8.023	
-----