{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Os", "surface_phase": "pc", "species": {"text": "Kr+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Kr+ on Os(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.114, "q": 16.39, "mu": 2.162, "epsilonL": 1.537e-06, "Eth": 36.19}, "E_min": 36.19, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
36.19	0.0	
42.54	0.0001342	
50.01	0.0008438	
58.79	0.00285	
69.1	0.007435	
81.23	0.01673	
95.49	0.03393	
112.3	0.06318	
132.0	0.1086	
155.1	0.1728	
182.4	0.2545	
214.4	0.3493	
252.0	0.4511	
296.2	0.5547	
348.2	0.6576	
409.3	0.7594	
481.2	0.8609	
565.6	0.9634	
664.9	1.069	
781.6	1.178	
918.8	1.291	
1080.0	1.411	
1270.0	1.537	
1493.0	1.669	
1755.0	1.809	
2063.0	1.956	
2425.0	2.11	
2850.0	2.272	
3350.0	2.441	
3939.0	2.616	
4630.0	2.798	
5443.0	2.986	
6398.0	3.179	
7521.0	3.376	
8841.0	3.578	
10390.0	3.783	
12220.0	3.989	
14360.0	4.197	
16880.0	4.404	
19850.0	4.609	
23330.0	4.812	
27420.0	5.01	
32240.0	5.202	
37900.0	5.386	
44550.0	5.561	
52370.0	5.725	
61560.0	5.876	
72370.0	6.012	
85070.0	6.131	
-----