{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Os", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on Os(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.5133, "q": 0.0089, "mu": 1.302, "epsilonL": 9.784e-05, "Eth": 458.6}, "E_min": 458.6, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
458.6	1.963e-24	
511.8	3.107e-05	
571.3	8.985e-05	
637.6	0.0001771	
711.7	0.0002964	
794.4	0.0004504	
886.7	0.0006398	
989.7	0.0008622	
1105.0	0.001112	
1233.0	0.001379	
1376.0	0.001653	
1536.0	0.001923	
1714.0	0.002178	
1914.0	0.00241	
2136.0	0.002613	
2384.0	0.002787	
2661.0	0.002929	
2970.0	0.003043	
3315.0	0.00313	
3700.0	0.003192	
4130.0	0.003232	
4610.0	0.003252	
5145.0	0.003256	
5743.0	0.003244	
6410.0	0.00322	
7154.0	0.003183	
7985.0	0.003135	
8913.0	0.003078	
9948.0	0.003013	
11100.0	0.002941	
12390.0	0.002862	
13830.0	0.002778	
15440.0	0.002689	
17230.0	0.002596	
19240.0	0.0025	
21470.0	0.002402	
23960.0	0.002302	
26750.0	0.002201	
29850.0	0.002101	
33320.0	0.002	
37190.0	0.0019	
41510.0	0.001802	
46340.0	0.001705	
51720.0	0.001611	
57730.0	0.001519	
64430.0	0.00143	
71920.0	0.001344	
80270.0	0.001261	
89590.0	0.001181	
-----