{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Re", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of Xe+ on Re(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1345, "q": 23.62, "mu": 2.18, "epsilonL": 8.319e-07, "Eth": 42.67}, "E_min": 42.67, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
42.67	0.0	
49.99	9.621e-05	
58.57	0.0006097	
68.62	0.002067	
80.39	0.005413	
94.19	0.01226	
110.3	0.02517	
129.3	0.04778	
151.5	0.08456	
177.5	0.1397	
207.9	0.2154	
243.6	0.3101	
285.4	0.419	
334.3	0.5358	
391.7	0.6554	
458.9	0.7752	
537.6	0.8947	
629.9	1.015	
738.0	1.137	
864.6	1.263	
1013.0	1.395	
1187.0	1.532	
1390.0	1.678	
1629.0	1.831	
1908.0	1.994	
2236.0	2.167	
2620.0	2.349	
3069.0	2.542	
3596.0	2.745	
4212.0	2.958	
4935.0	3.182	
5782.0	3.415	
6774.0	3.658	
7937.0	3.911	
9298.0	4.172	
10890.0	4.441	
12760.0	4.716	
14950.0	4.998	
17520.0	5.285	
20520.0	5.575	
24050.0	5.867	
28170.0	6.16	
33010.0	6.452	
38670.0	6.741	
45300.0	7.025	
53080.0	7.302	
62180.0	7.57	
72850.0	7.827	
85350.0	8.071	
-----