{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Re", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on Re(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.6547, "q": 0.0089, "mu": 1.592, "epsilonL": 9.955e-05, "Eth": 410.8}, "E_min": 410.8, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
410.8	0.0	
459.5	1.244e-05	
514.0	4.53e-05	
575.0	0.0001036	
643.3	0.0001945	
719.6	0.0003253	
805.0	0.0005015	
900.5	0.0007247	
1007.0	0.0009906	
1127.0	0.001289	
1261.0	0.001602	
1410.0	0.001914	
1578.0	0.002207	
1765.0	0.002469	
1974.0	0.002694	
2209.0	0.002879	
2471.0	0.003026	
2764.0	0.003138	
3092.0	0.003219	
3459.0	0.003275	
3869.0	0.003307	
4328.0	0.003321	
4842.0	0.003317	
5417.0	0.0033	
6060.0	0.003269	
6779.0	0.003227	
7583.0	0.003176	
8483.0	0.003115	
9490.0	0.003047	
10620.0	0.002971	
11880.0	0.00289	
13280.0	0.002803	
14860.0	0.002711	
16620.0	0.002616	
18600.0	0.002518	
20800.0	0.002417	
23270.0	0.002315	
26040.0	0.002212	
29130.0	0.002108	
32580.0	0.002005	
36450.0	0.001903	
40770.0	0.001803	
45610.0	0.001704	
51030.0	0.001608	
57080.0	0.001514	
63850.0	0.001423	
71430.0	0.001336	
79910.0	0.001251	
89390.0	0.001171	
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