{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "W", "surface_phase": "pc", "species": {"text": "H+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
------------------------------------------------------------------------
Sputtering of H+ on W(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 1.009, "q": 0.0075, "mu": 1.205, "epsilonL": 0.0001013, "Eth": 457.4}, "E_min": 457.4, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
457.4	0.0	
510.6	1.702e-05	
569.9	4.616e-05	
636.2	8.815e-05	
710.1	0.0001453	
792.6	0.0002203	
884.7	0.0003155	
987.5	0.0004327	
1102.0	0.0005727	
1230.0	0.0007345	
1373.0	0.0009155	
1533.0	0.001111	
1711.0	0.001315	
1910.0	0.001519	
2132.0	0.001718	
2380.0	0.001903	
2656.0	0.00207	
2965.0	0.002216	
3310.0	0.002338	
3694.0	0.002436	
4124.0	0.002511	
4603.0	0.002565	
5138.0	0.002598	
5735.0	0.002613	
6402.0	0.002613	
7145.0	0.002598	
7976.0	0.002571	
8903.0	0.002534	
9938.0	0.002486	
11090.0	0.002431	
12380.0	0.00237	
13820.0	0.002302	
15430.0	0.00223	
17220.0	0.002153	
19220.0	0.002074	
21450.0	0.001993	
23950.0	0.001909	
26730.0	0.001825	
29840.0	0.001741	
33310.0	0.001657	
37180.0	0.001574	
41500.0	0.001492	
46320.0	0.001411	
51700.0	0.001332	
57710.0	0.001256	
64420.0	0.001181	
71900.0	0.00111	
80260.0	0.001041	
89590.0	0.0009746	
-----