{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ta", "surface_phase": "pc", "species": {"text": "Ta+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Ta+ on Ta(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1583, "q": 26.69, "mu": 1.978, "epsilonL": 5.165e-07, "Eth": 41.49}, "E_min": 41.49, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
41.49	2.376e-34	
48.64	8.015e-05	
57.02	0.0004352	
66.84	0.00134	
78.35	0.00327	
91.85	0.007012	
107.7	0.01381	
126.2	0.02552	
148.0	0.04468	
173.4	0.07441	
203.3	0.1179	
238.3	0.1774	
279.4	0.2535	
327.5	0.3443	
383.9	0.4465	
450.1	0.556	
527.6	0.67	
618.5	0.7866	
725.0	0.9056	
849.9	1.027	
996.3	1.153	
1168.0	1.284	
1369.0	1.421	
1605.0	1.566	
1881.0	1.719	
2205.0	1.882	
2585.0	2.054	
3031.0	2.237	
3553.0	2.431	
4165.0	2.637	
4882.0	2.854	
5723.0	3.084	
6709.0	3.325	
7864.0	3.577	
9219.0	3.841	
10810.0	4.117	
12670.0	4.402	
14850.0	4.698	
17410.0	5.002	
20410.0	5.315	
23920.0	5.634	
28040.0	5.959	
32870.0	6.288	
38540.0	6.619	
45170.0	6.951	
52960.0	7.282	
62080.0	7.609	
72770.0	7.932	
85310.0	8.246	
-----