{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ta", "surface_phase": "pc", "species": {"text": "Xe+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Xe+ on Ta(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1175, "q": 20.22, "mu": 2.013, "epsilonL": 8.488e-07, "Eth": 42.51}, "E_min": 42.51, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
42.51	1.186e-34	
49.81	0.0001287	
58.36	0.0007161	
68.38	0.002235	
80.12	0.005493	
93.87	0.0118	
110.0	0.02314	
128.9	0.04224	
151.0	0.07238	
176.9	0.1167	
207.3	0.1772	
242.9	0.2534	
284.6	0.3425	
333.4	0.4404	
390.6	0.5431	
457.7	0.6479	
536.3	0.7536	
628.3	0.8603	
736.2	0.9689	
862.6	1.081	
1011.0	1.196	
1184.0	1.317	
1387.0	1.444	
1626.0	1.578	
1905.0	1.72	
2232.0	1.869	
2615.0	2.027	
3064.0	2.193	
3590.0	2.369	
4206.0	2.553	
4928.0	2.745	
5774.0	2.946	
6765.0	3.156	
7927.0	3.373	
9288.0	3.597	
10880.0	3.828	
12750.0	4.065	
14940.0	4.307	
17500.0	4.553	
20510.0	4.802	
24030.0	5.052	
28150.0	5.303	
32990.0	5.552	
38650.0	5.799	
45290.0	6.042	
53060.0	6.278	
62170.0	6.507	
72840.0	6.725	
85350.0	6.932	
-----