{"process": "Sputtering", "process_types": [{"abbreviation": "MPS", "description": "Physical Sputtering"}, {"abbreviation": "MSP", "description": "Sputtering"}], "surface": "Ta", "surface_phase": "pc", "species": {"text": "Kr+", "charge": 1}, "temperature": 300, "comment": "Eckstein equation (2) is incorrect; use formula given on p.18 of APID-7B", "refs": [{"id": 144, "authors": "W. Eckstein", "title": "Sputtering Yields. In: Sputtering by Particle Bombardment", "journal": "Topics in Applied Physics", "volume": "110", "page_start": "", "page_end": "", "article_number": "", "year": 2007, "note": "Springer, Berlin, Heidelberg", "doi": "https://doi.org/10.1007/978-3-540-44502-9_3", "bibcode": "", "url": ""}]}
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Sputtering of Kr+ on Ta(pc) at 300 K
{"fit_function": "SPTEEX", "coeffs": {"lambda": 0.1074, "q": 14.2, "mu": 2.046, "epsilonL": 1.589e-06, "Eth": 34.5}, "E_min": 34.5, "E_max": 100000}
angle = 0.0 deg
E /eV	P	
34.5	4.244e-35	
40.6	0.000151	
47.77	0.0008689	
56.21	0.002775	
66.15	0.006939	
77.83	0.01508	
91.58	0.02972	
107.8	0.05407	
126.8	0.09139	
149.2	0.1438	
175.6	0.2111	
206.6	0.2902	
243.1	0.3767	
286.0	0.4664	
336.6	0.5568	
396.0	0.6469	
466.0	0.7371	
548.3	0.8282	
645.2	0.9215	
759.2	1.018	
893.3	1.118	
1051.0	1.224	
1237.0	1.334	
1455.0	1.451	
1712.0	1.573	
2015.0	1.702	
2371.0	1.837	
2790.0	1.979	
3283.0	2.126	
3863.0	2.28	
4545.0	2.439	
5348.0	2.603	
6293.0	2.772	
7405.0	2.945	
8713.0	3.121	
10250.0	3.299	
12060.0	3.48	
14190.0	3.661	
16700.0	3.841	
19650.0	4.02	
23130.0	4.196	
27210.0	4.368	
32020.0	4.534	
37680.0	4.694	
44330.0	4.845	
52160.0	4.986	
61380.0	5.115	
72230.0	5.231	
84990.0	5.332	
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